This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008
Title: Yukio Oshima: Innovator in Substrate-Cutting Technology
Introduction
Yukio Oshima is a notable inventor based in Sulta-City, Osaka, Japan. He has made significant contributions to the field of substrate-cutting technology. His innovative approach has led to the development of a unique substrate-cutting system that enhances efficiency in manufacturing processes.
Latest Patents
Yukio Oshima holds 1 patent for his invention titled "Substrate-cutting system, substrate-producing apparatus, substrate-scribing method, and substrate-cutting method." This patent describes a clamping device installed on a stand with a hollow rectangular parallelepiped shape. The device is designed to clamp at least one side edge portion of a mother substrate during transport. The invention features a pair of substrate-cutting devices that cut the mother substrate from both its upper and lower faces. These devices are mounted on a scribing device guide body that is movable along one side of the stand. The design allows for precise cutting and scribing, improving the overall manufacturing process.
Career Highlights
Throughout his career, Yukio Oshima has focused on advancing substrate technology. His work has been instrumental in developing systems that streamline production and enhance product quality. His innovative designs have garnered attention in the industry, showcasing his expertise and commitment to technological advancement.
Collaborations
Yukio has collaborated with talented individuals such as Yoshitaka Nishio and Yasutomo Okajima. These partnerships have contributed to the successful development of his patented technologies.
Conclusion
Yukio Oshima's contributions to substrate-cutting technology exemplify his innovative spirit and dedication to improving manufacturing processes. His patent reflects a significant advancement in the field, showcasing his ability to create practical solutions for complex challenges.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile