Sapporo, Japan

Yukiko Hane

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yukiko Hane. Retrieved from https://idiyas.com/inventor/yukiko-hane-j3a6cicc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Yukiko Hane

Introduction

Yukiko Hane is a prominent inventor based in Sapporo, Japan. She has made significant strides in the field of polymer technology. Her work focuses on developing materials that possess exceptional mechanical strength and the ability to maintain surface wetness over extended periods.

Latest Patents

Yukiko Hane holds 1 patent for her invention titled "Polymer gel and preparation method therefor." This innovative polymer gel is designed to be widely applicable across various fields due to its excellent mechanical properties and moisture retention capabilities. The patent outlines methods for preparing this advanced polymer gel, showcasing her expertise in material science.

Career Highlights

Yukiko Hane is currently employed at Samsung Electronics Co., Ltd., where she continues to push the boundaries of innovation. Her work has contributed to advancements in polymer applications, enhancing the performance and functionality of products in diverse industries.

Collaborations

Throughout her career, Yukiko has collaborated with notable colleagues, including Kazuo Iijima and Jian Ping Gong. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Yukiko Hane's contributions to polymer technology exemplify her dedication to innovation and excellence. Her patent on polymer gel demonstrates her ability to create materials that can significantly impact various applications. Her work continues to inspire future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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