Yukihiro Oka

Title: Yukihiro Oka: Innovator in Surface Treatment Technologies

Introduction

Yukihiro Oka is a prominent inventor based in Mie-ken, Japan. He has made significant contributions to the field of electronic device manufacturing through his innovative approaches to surface treatment methods. His work has led to advancements that enhance the efficiency and effectiveness of electronic devices.

Latest Patents

Yukihiro Oka holds a patent for a surface treatment method, etching method, and method for manufacturing electronic devices. This patent describes a process that involves removing a fluorocarbon-containing reaction product from the surface of a workpiece using oxygen gas plasma processing. The workpiece consists of multiple layers, and the fluorocarbon-containing reaction product is deposited by successively etching these layers. After the removal of the reaction product, an oxide-containing reaction product is eliminated from the surface using hydrogen fluoride gas.

Career Highlights

Oka is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work at Toshiba has allowed him to focus on developing innovative solutions that address challenges in electronic device manufacturing. His expertise in surface treatment methods has positioned him as a key figure in this area of research.

Collaborations

Yukihiro Oka has collaborated with notable colleagues, including Katsuaki Aoki and Naoya Hayamizu. These collaborations have fostered a productive environment for innovation and have contributed to the advancement of technologies in their field.

Conclusion

Yukihiro Oka's contributions to surface treatment technologies have made a significant impact on the manufacturing of electronic devices. His innovative methods and collaborations with esteemed colleagues continue to drive progress in this important area of technology.