Saitama, Japan

Yukihiro Ohuchi


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 16(Granted Patents)


Location History:

  • Saitama, JP (1990 - 1991)
  • Ohmiya, JP (1991)

Company Filing History:


Years Active: 1990-1991

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Innovations of Yukihiro Ohuchi

Introduction

Yukihiro Ohuchi is a prominent inventor based in Saitama, Japan. He has made significant contributions to the field of superconductive materials, holding a total of four patents. His work focuses on improving the efficiency and cost-effectiveness of superconductive oxide films.

Latest Patents

One of his latest patents is for a sputtering target used for forming quinary superconductive oxide. This target contains metal copper ranging between about 8% and about 40% by volume, which is dispersed into a quaternary or quinary complex oxide. The inclusion of metal copper enhances both the thermal and electrical conductivity of the target, reducing the likelihood of cracks and making it suitable for d.c. sputtering systems. This innovation ultimately decreases the production cost of the thin film. Another notable patent is a method of making a sputtering target for a bismuth-based superconductor. This method involves preparing ingredient powders of calcium carbonate, strontium carbonate, and copper oxide, producing a porous bulk body of a complex oxide, and then impregnating molten bismuth into the porous bulk body.

Career Highlights

Yukihiro Ohuchi is currently employed at Mitsubishi Metal Corporation, where he continues to develop advanced materials for various applications. His expertise in superconductive materials has positioned him as a key figure in the industry.

Collaborations

He has collaborated with notable coworkers such as Tadashi Sugihara and Takuo Takeshita, contributing to the advancement of their shared projects.

Conclusion

Yukihiro Ohuchi's innovative work in the field of superconductive materials has led to significant advancements in technology. His patents reflect a commitment to improving the efficiency and cost-effectiveness of superconductive oxide films.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…