Yukichi Horioka

Title: Yukichi Horioka: A Trailblazer in the World of Technology

Introduction: Yukichi Horioka, an inventor based in Tokyo, Japan, has established himself as a trailblazer in the realm of technology through his relentless pursuit of innovation and unwavering commitment to excellence. His groundbreaking contributions have not only shaped the current technological landscape but continue to inspire future generations of inventors.

Latest Patents: Yukichi Horioka holds 1 patent for his manufacturing method of a semiconductor wafer with a trench structure and epitaxial layer. This patent focuses on changing the resistivity of an epitaxial layer in a trench by reducing the quantity of impurities diffused into the epitaxial layer, thereby minimizing the impact of auto-doping from the semiconductor wafer. The epitaxial layer is grown in a trench by gradually decreasing the temperature in the range of 400 to 1150°C using a vapor growth method while supplying a silane gas as a raw material gas.

Career Highlights: Yukichi Horioka has made significant contributions during his tenure at Sumco Corporation and Denso Corporation. His innovative approach to semiconductor wafer manufacturing has led to advancements in the industry, showcasing his expertise and dedication to technological progress.

Collaborations: Throughout his career, Yukichi Horioka has collaborated with esteemed coworkers such as Syouji Nogami and Shoichi Yamauchi. Together, they have worked on various projects, combining their collective knowledge and expertise to push the boundaries of technological innovation.

Conclusion: Yukichi Horioka's remarkable journey as an inventor underscores his impact on the world of technology. His pioneering work in semiconductor wafer manufacturing and trench structures serves as a testament to his visionary outlook and relentless pursuit of excellence. Yukichi Horioka's legacy will continue to inspire and shape the future of technological advancement for years to come.