Kanagawa, Japan

Yuki Saeki

This inventor holds 1 USPTO granted patent. Top assignee: Via Mechanics, Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuki Saeki. Retrieved from https://idiyas.com/inventor/yuki-saeki-dsw5yfq7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Yuki Saeki - Innovator in Laser Processing Technology

Introduction

Yuki Saeki is a prominent inventor based in Kanagawa, Japan. She has made significant contributions to the field of laser processing technology. Her innovative approach focuses on enhancing the efficiency and quality of laser applications.

Latest Patents

Yuki Saeki holds 1 patent for her invention titled "Laser processing apparatus and laser processing method." The purpose of this invention is to quickly change the focal point of a laser emission system. This capability allows for high-quality processing with improved efficiency. The laser processing apparatus includes a laser oscillator that outputs a laser pulse, a laser deflector that deflects the laser pulse in a two-dimensional direction, and a controller that manages both the laser oscillator and the laser deflector. A key feature of this apparatus is the inclusion of an electro-optic device that can electrically change the focal point of the laser pulse under the controller's guidance.

Career Highlights

Yuki Saeki is currently associated with Via Mechanics, Ltd., where she continues to develop and refine her innovative technologies. Her work has positioned her as a leader in the field of laser processing.

Conclusion

Yuki Saeki's contributions to laser processing technology exemplify her commitment to innovation and excellence. Her patent reflects her ability to address complex challenges in the industry, paving the way for advancements in laser applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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