Yuki Ojima

Title: Yuki Ojima and Semiconductor Inspection Innovation.

Introduction

Yuki Ojima is an inventor associated with Hitachi High-Tech Corporation in Tokyo, Japan. Her patent work addresses semiconductor inspection methods for analyzing wafer patterns without destructive cross-sectional observation. The supplied information lists 1 patent.

Latest Patents

Ojima’s listed patent is “Processor System, Semiconductor Inspection System, and Program.” It describes a processor system that analyzes scanning electron microscope images of a sample. The system calculates feature data at multiple locations in a reference region, derives a statistical value from those measurements, and uses that value to convert feature data from corresponding evaluation regions. This approach is intended to quantify changes in three-dimensional pattern shape, including cross-sectional characteristics, across a wafer surface or between wafers without first cutting the sample for observation.

Career Highlights

Ojima’s listed invention focuses on semiconductor metrology and image-based inspection. By using statistical comparisons of image features, the disclosed technique aims to help characterize wafer patterns while preserving the sample.

Collaborations

The supplied information identifies Kenji Yasui and Mayuka Osaki as Ojima’s coworkers. It does not specify their roles in the patent or describe particular collaborative contributions.

Conclusion

Yuki Ojima’s listed patent presents a nondestructive, image-based approach to measuring changes in semiconductor pattern geometry, reflecting her work in inspection technology at Hitachi High-Tech Corporation.