Company Filing History:
Years Active: 2022-2023
Title: Yuki Kera: Innovator in Chemically Amplified Resist Compositions
Introduction
Yuki Kera is a prominent inventor based in Joetsu, Japan. She has made significant contributions to the field of photolithography through her innovative patents. With a total of two patents to her name, Kera has established herself as a key figure in the development of advanced materials for semiconductor manufacturing.
Latest Patents
Kera's latest patents include a novel sulfonium compound and a chemically amplified resist composition. The first patent describes a sulfonium compound of formula (A) and a chemically amplified resist composition that utilizes this compound as a photoacid generator (PAG). This composition demonstrates high sensitivity and reduced acid diffusion when processed by photolithography using KrF or ArF excimer lasers, electron beams, or extreme ultraviolet (EUV) light. The second patent introduces a salt compound featuring an amide bond in its anion structure. This chemically amplified resist composition offers advantages such as minimal defects and improved sensitivity, line width roughness (LWR), mask error factor (MEF), and critical dimension uniformity (CDU) when subjected to high-energy radiation during lithography.
Career Highlights
Kera is currently employed at Shin-Etsu Chemical Co., Ltd., where she continues to push the boundaries of innovation in the semiconductor industry. Her work has been instrumental in enhancing the performance of resist materials, which are crucial for the fabrication of integrated circuits.
Collaborations
Kera collaborates with notable colleagues, including Masahiro Fukushima and Masaki Ohashi, who contribute to her research and development efforts. Their combined expertise fosters a dynamic environment for innovation.
Conclusion
Yuki Kera's contributions to the field of chemically amplified resist compositions highlight her role as a leading inventor in semiconductor technology. Her innovative patents reflect her commitment to advancing the industry and improving lithography processes.