Company Filing History:
Years Active: 2017
Title: Yuki Kaneko: Innovator in Etching Methods
Introduction
Yuki Kaneko is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of etching methods, holding a total of 2 patents. His work focuses on advanced techniques that enhance the efficiency and effectiveness of plasma processing.
Latest Patents
Kaneko's latest patents include innovative etching methods. The first patent discloses a method for etching a first region that includes a multi-layer film formed by alternating silicon oxide films and silicon nitride films. This method involves providing a processing target object with a mask on both the first and second regions within a plasma processing apparatus. The process generates plasma from a first processing gas, which includes a hydrofluorocarbon gas, and alternates with plasma generated from a second processing gas containing a fluorocarbon gas.
The second patent describes a method of etching a first region with a multilayered film, where first dielectric films and second dielectric films, serving as silicon nitride films, are alternately stacked. This method includes a first plasma process that generates plasma from a fluorocarbon gas and oxygen gas, followed by a second plasma process that generates plasma from hydrogen gas, nitrogen trifluoride gas, and a carbon-containing gas. The temperature of the electrostatic chuck is carefully controlled during these processes to optimize results.
Career Highlights
Yuki Kaneko is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His expertise in etching methods has positioned him as a valuable asset to the company, contributing to advancements in plasma processing technologies.
Collaborations
Kaneko collaborates with talented coworkers, including Yusuke Saitoh and Yu Nagatomo, who bring diverse skills and perspectives to their projects. Their teamwork fosters innovation and drives the development of cutting-edge technologies in their field.
Conclusion
Yuki Kaneko's contributions to etching methods reflect his dedication to innovation in the semiconductor industry. His patents and collaborative efforts continue to influence advancements in plasma processing technologies.