Toyama, Japan

Yuki Ishikawa

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Ykk Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuki Ishikawa. Retrieved from https://idiyas.com/inventor/yuki-ishikawa-6p8d8xto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Yuki Ishikawa: Innovator in Slide Fastener Technology

Introduction

Yuki Ishikawa is a notable inventor based in Toyama, Japan. She has made significant contributions to the field of fastening technology, particularly through her work at YKK Corporation. With a focus on innovation, Ishikawa has developed solutions that enhance the functionality and reliability of slide fasteners.

Latest Patents

Ishikawa holds a patent for a "Chain for Slide Fastener." This invention showcases her expertise in creating durable and efficient fastening systems. The patent reflects her commitment to advancing technology in the textile and fashion industries.

Career Highlights

Throughout her career at YKK Corporation, Ishikawa has been instrumental in driving innovation. Her work has not only improved product quality but has also contributed to the company's reputation as a leader in fastening solutions. With 1 patent to her name, she exemplifies the spirit of creativity and technical skill.

Collaborations

Ishikawa collaborates with her coworker, Ryo Hironaga, who is also a talented professional in the field. Their partnership fosters a dynamic environment for innovation and problem-solving within the company.

Conclusion

Yuki Ishikawa's contributions to slide fastener technology highlight her role as an influential inventor. Her dedication to innovation at YKK Corporation continues to shape the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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