Niigata, Japan

Yukari Kohtari

This inventor holds 1 USPTO granted patent. Top assignee: Toshiba Ceramics Co., Ltd.. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yukari Kohtari. Retrieved from https://idiyas.com/inventor/yukari-kohtari

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Yukari Kohtari: Innovator in Silicon Wafer Manufacturing

Introduction

Yukari Kohtari is a prominent inventor based in Niigata, Japan. She has made significant contributions to the field of semiconductor manufacturing, particularly in the area of silicon wafer production. Her innovative approach has led to advancements that enhance the quality and efficiency of silicon wafers.

Latest Patents

Yukari Kohtari holds a patent for a silicon wafer manufacturing method that eliminates the need for final mirror-polishing. This method involves mirror-polishing a silicon wafer until achieving specific surface roughness values, followed by heat treatment in a hydrogen gas atmosphere. The patent details two approaches for achieving desired surface roughness, ensuring high-quality wafers suitable for various applications.

Career Highlights

Kohtari is associated with Toshiba Ceramics Co., Ltd., where she has been instrumental in developing advanced manufacturing techniques. Her work has not only improved production processes but has also contributed to the overall advancement of semiconductor technology.

Collaborations

Yukari Kohtari has collaborated with notable colleagues, including Jun Yoshikawa and Masayuki Sanada. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Yukari Kohtari's contributions to silicon wafer manufacturing exemplify her dedication to innovation in the semiconductor industry. Her patented methods are paving the way for improved manufacturing processes and higher quality products.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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