Company Filing History:
Years Active: 2020-2022
Title: Yujie Geng: Innovator in Microelectronics
Introduction
Yujie Geng is a prominent inventor based in Beijing, China. He has made significant contributions to the field of microelectronics, particularly through his innovative patents. With a total of three patents to his name, Geng is recognized for his advancements in loading and deposition apparatuses.
Latest Patents
Geng's latest patents include a loading apparatus and a physical vapor deposition (PVD) apparatus. The loading apparatus is designed to support a workpiece and features a first support member that elevates a cover ring to prevent contact with the workpiece, thereby reducing stress forces on the workpiece from external components. Additionally, he has developed a method for forming a film and an aluminum nitride film. This method involves two pre-sputtering steps with varying parameters before the main sputtering, which stabilizes target conditions. The aluminum nitride film serves as a buffer layer in electronic devices, enhancing the performance of both the aluminum nitride and gallium nitride layers.
Career Highlights
Yujie Geng is currently employed at Beijing Naura Microelectronics Equipment Co., Ltd. His work at this company has positioned him as a key player in the microelectronics sector. His innovative approaches have led to advancements that improve the quality and performance of electronic devices.
Collaborations
Geng collaborates with notable colleagues, including Ming Wang and Boyu Dong. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Yujie Geng's contributions to microelectronics through his patents and collaborative efforts highlight his role as an influential inventor. His work continues to impact the industry positively, paving the way for future innovations.