Location History:
- Chiyoda-ku, JP (2016)
- Tokyo, JP (2017)
Company Filing History:
Years Active: 2016-2017
Title: Innovations of Yuiko Yoshida in Polishing Technology
Introduction
Yuiko Yoshida is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of polishing technology, particularly in the development of advanced polishing agents. With a total of 2 patents to his name, Yoshida's work is recognized for its innovative approach to enhancing the efficiency and effectiveness of polishing processes.
Latest Patents
Yoshida's latest patents include a polishing agent and method that incorporates cerium oxide particles, a water-soluble organic polymer, and a water-soluble polyamide. This polishing agent is designed to maintain a pH of 7 or less, optimizing its performance in various applications. Another patent focuses on a polishing agent specifically for semiconductor integrated circuit devices, detailing the precise characteristics of cerium oxide particles and their lattice constants to improve the polishing process.
Career Highlights
Yuiko Yoshida is currently employed at Asahi Glass Company, Limited, where he continues to innovate in the field of polishing technology. His work has not only advanced the understanding of polishing agents but has also contributed to the development of more efficient manufacturing processes in the semiconductor industry.
Collaborations
Yoshida collaborates with talented coworkers, including Iori Yoshida and Junko Anzai, who bring diverse expertise to their projects. Their teamwork fosters an environment of creativity and innovation, leading to groundbreaking advancements in their field.
Conclusion
In summary, Yuiko Yoshida's contributions to polishing technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of more effective polishing agents and methods, showcasing the importance of innovation in manufacturing processes.