Asahi Glass Company, Limited

Yuiko Yoshida

Iori Yoshida

Junko Anzai

The present invention relates to a polishing agent including: cerium oxide particles; a water-soluble organic polymer having at least one selected from a carboxylic acid group and a salt of carboxylic acid; a water-soluble polyamide having at least one selected from a tertiary amino group and an oxyalkylene chain in a molecule thereof; and water, in which the polishing agent has a pH of 7 or less.

Polishing agent, polishing method, and liquid additive for polishing

A first polishing agent contains: cerium oxide particles; and water, wherein, in IR spectrum of the cerium oxide particle, a value A found by a formula below from a ratio (I/I') between a value I of an absorbance of 3566 cmand a value I&#x2032; of an absorbance of 3695 cm, and a crystallite diameter XS, is 0.08 or less.=(&#x2032;)/ A second polishing agent contains: cerium oxide particles; and water, wherein, in the cerium oxide particle, a deviation B of a lattice constant found by a formula below from a theoretical lattice constant (a&#x2032;) and a lattice constant (a) measured by powder X-ray diffraction, is &#x2212;0.16% or more.(%)=(1&#x2212;&#x2032;)&#xd7;100

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Tokyo, Japan

Yuiko Yoshida