Company Filing History:
Years Active: 2024
Title: Yuhang Jin: Innovator in Semiconductor Polishing Technology
Introduction
Yuhang Jin is a prominent inventor based in Guangdong, China. He has made significant contributions to the field of semiconductor technology, particularly in the area of polishing methods. His innovative work has led to the development of advanced materials that enhance the efficiency of semiconductor manufacturing processes.
Latest Patents
Yuhang Jin holds a patent for a "Magnetorheological-elastomer polishing pad for chemical mechanical polishing of semiconductor wafer, preparation method and application thereof." This invention discloses a magnetorheological-elastomer (MRE) polishing pad that is suitable for chemical mechanical polishing (CMP) of semiconductor wafers. The MRE polishing pad enables high-efficiency magnetic control polishing while simultaneously facilitating a high-efficiency Fenton reaction. The pad is designed to form an organosilicon-polyurethane matrix through an organosilicon-modified polyurethane prepolymer. It combines the high flexibility and excellent mechanical properties of organosilicon materials. The incorporation of CIP@FeO composite magnetic particles allows the polishing pad to exhibit a high magnetorheological effect, which aids in oxidizing the surface of the semiconductor wafer to generate an oxide layer. This innovation reduces the material removal difficulty of abrasive materials and the polishing pad under mechanical action.
Career Highlights
Yuhang Jin is affiliated with the Guangdong University of Technology, where he continues to advance research in semiconductor technologies. His work has garnered attention for its practical applications in improving the efficiency of semiconductor wafer polishing processes.
Collaborations
Yuhang Jin collaborates with notable colleagues such as Jiabin Lu and Da Hu. Their combined expertise contributes to the ongoing research and development in the field of semiconductor technology.
Conclusion
Yuhang Jin's innovative contributions to semiconductor polishing technology highlight his role as a leading inventor in this field. His patented work on magnetorheological-elastomer polishing pads represents a significant advancement in the efficiency of semiconductor manufacturing processes.