Company Filing History:
2 out of 2 
2 out of 2 
1 out of 34 Years Active: 2016-2025
Title: Yuelin Wang: Innovator in Surface Modification Technologies
Introduction
Yuelin Wang is a prominent inventor based in Guangzhou, China, known for his contributions to the field of surface modification technologies. With a total of four patents to his name, Wang has made significant advancements that enhance the efficiency and effectiveness of various industrial processes.
Latest Patents
Wang's latest patents include a "Combined treatment device and method for surface modification of fumed silica." This innovative method involves using two sets of modification devices to treat fumed silica, allowing for the efficient separation of unreacted modifiers and by-products. The by-products are then utilized as reaction assistants in subsequent modifications, promoting sustainability through the reuse of materials. Another notable patent is the "Gas nozzle, gas reaction device and gas hydrolysis reaction method." This invention features a unique design of fuel gas channels that create a downwardly conical spiral flame, enhancing the combustion process and improving the overall efficiency of gas reactions.
Career Highlights
Throughout his career, Yuelin Wang has worked with notable companies such as Guangzhou Huifu Research Institute Co., Ltd. and Hubei Huifu Nanomaterial Co., Ltd. His work in these organizations has allowed him to develop and refine his innovative technologies, contributing to advancements in nanomaterials and surface modification techniques.
Collaborations
Wang has collaborated with esteemed colleagues, including Xianjian Duan and Chunlei Wu. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Yuelin Wang's contributions to surface modification technologies have positioned him as a key figure in his field. His innovative patents and collaborative efforts continue to drive advancements in industrial applications, showcasing the importance of creativity and research in technology development.