This inventor holds 1 USPTO granted patent. Top assignee: Dalian University of Technology. Active years: 2021.
Company Filing History:
Years Active: 2021
Title: Innovations of Yuefeng Du in Self-Healing Nanowires
Introduction
Yuefeng Du is a prominent inventor based in Liaoning, China. He has made significant contributions to the field of materials science, particularly in the development of self-healing methods for nanowires. His innovative approach has the potential to revolutionize the use of silicon carbide (SiC) nanowires in various applications.
Latest Patents
Yuefeng Du holds a patent for a self-healing method for fractured SiC single crystal nanowires. This method involves the use of a hair from a Chinese brush pen made of yellow weasel's hair to transfer nanowires, which are placed on an in-situ TEM mechanical microtest apparatus. The process includes an in-situ nanomechanical tension test where the nanowires are subjected to a displacement of 0-200 nm. The fracture strength of the single crystal nanowires is measured to be between 12-15 GPa. After fracturing, the unloading process allows slight contact between the fractured end surfaces, and self-healing occurs in a vacuum chamber. Partial recrystallization is observed at the fracture site after self-healing, and a subsequent fracture strength test reveals that the strength after healing ranges from 1-2.5 GPa, with a recovery ratio of 10-20%.
Career Highlights
Yuefeng Du is affiliated with Dalian University of Technology, where he continues to advance research in nanotechnology and materials science. His work has garnered attention for its innovative approach to addressing the challenges associated with fractured nanowires.
Collaborations
Yuefeng Du has collaborated with notable colleagues, including Junfeng Cui and Zhenyu Zhang. Their combined expertise contributes to the ongoing research and development in the field of nanotechnology.
Conclusion
Yuefeng Du's innovative self-healing method for SiC single crystal nanowires represents a significant advancement in materials science. His contributions have the potential to enhance the durability and functionality of nanowires in various applications.