This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Innovations of Yuanhung Liu in Semiconductor Technology
Introduction
Yuanhung Liu is a notable inventor based in San Jose, CA, who has made significant contributions to the field of semiconductor technology. His innovative work focuses on enhancing the processes involved in semiconductor manufacturing, particularly in tungsten integration.
Latest Patents
Yuanhung Liu holds a patent titled "Silicon nitride damage-free dry etch method for tungsten removal in middle of line bottom-up tungsten integration." This patent describes a method for filling a feature in a semiconductor structure with metal. The process includes depositing a metal cap layer on the bottom surface of a feature formed within a dielectric layer and on the top surfaces of the dielectric layer. It also involves partially filling the feature from the bottom surface with a flowable polymer layer and performing a metal pullback process to selectively remove the metal cap layer on the top surfaces of the dielectric layer. The method utilizes a first etch process with molybdenum hexafluoride (MoF) and a second etch process to remove residues on the etched surfaces of the dielectric layer. This innovative approach enhances the efficiency and effectiveness of tungsten integration in semiconductor devices.
Career Highlights
Yuanhung Liu is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to develop and refine techniques that are crucial for modern semiconductor manufacturing.
Collaborations
Throughout his career, Yuanhung Liu has collaborated with talented professionals in the field, including Qihao Zhu and Chi Hong Ching. These collaborations have contributed to the advancement of semiconductor technologies and innovations.
Conclusion
Yuanhung Liu's contributions to semiconductor technology, particularly through his patented methods, demonstrate his expertise and commitment to innovation in the industry. His work continues to influence the development of efficient manufacturing processes in semiconductor devices.