Zhongshan, China

Yuancai Li

This inventor holds 1 USPTO granted patent. Top assignee: Union Optech Co., Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuancai Li. Retrieved from https://idiyas.com/inventor/yuancai-li

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Yuancai Li and an Ultra-Short-Focus Projection System.

Introduction

Yuancai Li is an inventor associated with Zhongshan, China, and Union Optech Co., Ltd. His listed patent concerns projection optics designed to deliver a large aperture and high resolution.

Latest Patents

The provided patent information lists one patent for Li: “Ultra-Short Focus Projecting Optical System and Projection Device.” The invention describes an optical system with a display unit, three lens groups, and an aspherical reflector arranged along the projection direction. The lens groups have positive, positive, and negative optical power, respectively. The first group includes a glass aspherical lens, a glass spherical lens, and a diaphragm. The lenses are shaped to bend toward the diaphragm from their centers to their peripheries. The disclosed design aims to achieve a large aperture and high resolution in a projection device.

Career Highlights

Li’s listed patent reflects work on optical engineering for projection systems. The patent record associates him with Union Optech Co., Ltd., a company connected to optical technology.

Collaborations

Liwei Quan and Shoulin Li are identified as Li’s coworkers. The provided information does not specify their roles in the patent or the invention.

Conclusion

Yuancai Li’s listed invention focuses on an ultra-short-focus projection system that combines carefully arranged lens groups and an aspherical reflector to support large-aperture, high-resolution projection.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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