Taoyuan, Taiwan

Yuan-Shan Wu


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Innovations of Yuan-Shan Wu in Photoresist Technology

Introduction

Yuan-Shan Wu is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of photoresist technology, particularly in enhancing adhesion processes. His innovative methods have implications for various applications in semiconductor manufacturing.

Latest Patents

Yuan-Shan Wu holds a patent titled "Method for enhancing adhesion between reworked photoresist and underlying oxynitride film." This patent describes a method that improves the adhesion of a reworked photoresist pattern layer to an underlying oxynitride film. The process involves forming a photoresist pattern layer on an oxynitride layer, removing the pattern layer using an acidic solution or oxygen-containing plasma, and performing a surface treatment on the oxynitride layer to repair any damage caused during the removal process. This innovative approach allows for the formation of a new photoresist pattern layer on the treated oxynitride layer.

Career Highlights

Yuan-Shan Wu is currently employed at Nan Ya Technology Corporation, where he continues to develop and refine his innovative techniques. His work has been instrumental in advancing the capabilities of photoresist applications in the semiconductor industry. With a focus on improving adhesion processes, he has contributed to the efficiency and effectiveness of manufacturing practices.

Collaborations

Yuan-Shan Wu has collaborated with several talented individuals in his field, including Wen-Bin Wu and Yi-Nan Chen. These collaborations have fostered a productive environment for innovation and have led to advancements in their respective areas of expertise.

Conclusion

Yuan-Shan Wu's contributions to photoresist technology exemplify the importance of innovation in the semiconductor industry. His patented methods for enhancing adhesion between reworked photoresist and oxynitride films demonstrate his commitment to advancing technology and improving manufacturing processes.

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