The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2006
Filed:
Jul. 01, 2003
Wen-bin Wu, Taoyuan, TW;
Yuan-shan Wu, Taoyuan, TW;
Yi-nan Chen, Taipei, TW;
Teng-yen Huang, Taipei, TW;
Wen-Bin Wu, Taoyuan, TW;
Yuan-Shan Wu, Taoyuan, TW;
Yi-Nan Chen, Taipei, TW;
Teng-Yen Huang, Taipei, TW;
Nanya Technology Corporation, Taoyuan, TW;
Abstract
A method for enhancing adhesion between a reworked photoresist and an underlying oxynitride film. A photoresist pattern layer is formed on an oxynitride layer overlying a substrate. The photoresist pattern layer is removed by acidic solution or oxygen-containing plasma. A surface treatment is performed on the oxynitride layer using a development solution to repair the damaged oxynitride layer due to removing the overlying photoresist pattern layer. A reworked photoresist pattern layer is formed on the oxynitride layer.