Durham, NC, United States of America

Yuan Fang


Average Co-Inventor Count = 3.4

ph-index = 3

Forward Citations = 14(Granted Patents)


Location History:

  • Cary, NC (US) (2017)
  • Durham, NC (US) (2018 - 2022)

Company Filing History:


Years Active: 2017-2022

where 'Filed Patents' based on already Granted Patents

6 patents (USPTO):

Title: The Innovations of Inventor Yuan Fang

Introduction

Yuan Fang is a notable inventor based in Durham, NC (US). He has made significant contributions to the field of lithography, holding a total of 6 patents. His work focuses on improving the precision and efficiency of mask-making processes.

Latest Patents

One of Yuan Fang's latest patents is titled "Lithographic mask correction using volume correction techniques." This innovative method involves computing a mask volume correction matrix for a given mask layout, which is essential for performing lithography processes. The mask volume correction matrix represents a diffraction field for a predetermined thickness of the mask material. By applying this matrix to the mask layout, a simulated mask pattern is generated, which is then provided to a mask-making tool.

Career Highlights

Throughout his career, Yuan Fang has worked with prominent companies in the semiconductor industry, including Cree GmbH and Taiwan Semiconductor Manufacturing Company Ltd. His expertise in lithography has positioned him as a valuable asset in these organizations.

Collaborations

Yuan Fang has collaborated with several talented individuals, including David Power and Zhiru Yu. These partnerships have contributed to the advancement of his innovative projects.

Conclusion

Yuan Fang's contributions to lithography and mask-making processes highlight his role as a significant inventor in the field. His patents and collaborations reflect his commitment to innovation and excellence.

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