Wilmington, DE, United States of America

Yu Teng Liang

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Du Pont China Limited. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yu Teng Liang. Retrieved from https://idiyas.com/inventor/yu-teng-liang-w2fe8agf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Innovations by Yu Teng Liang in Conductive Materials

Introduction

Yu Teng Liang is an accomplished inventor based in Wilmington, DE (US). He has made significant contributions to the field of conductive materials, particularly in the development of stretchable conductive pastes. His work is essential for advancing technologies in wearable electronics.

Latest Patents

One of Yu Teng Liang's notable patents is for a "Stretchable conductive fluoroelastomer paste composition." This invention relates to a polymer thick film (PTF) conductive paste composition that includes a conductive powder, a fluoroelastomer, a silane coupling agent, and solvents. The PTF conductive paste composition can be utilized to create printed conductors and electrically conductive adhesives on various articles. This innovative paste provides a stretchable electrical conductor, making it particularly suitable for wearable devices. He holds 1 patent in this area.

Career Highlights

Yu Teng Liang is associated with Du Pont China Limited, where he applies his expertise in materials science to develop cutting-edge solutions. His work at Du Pont has allowed him to collaborate with other experts in the field and contribute to advancements in conductive materials.

Conclusion

Yu Teng Liang's innovations in stretchable conductive materials are paving the way for new applications in wearable technology. His contributions are vital for the future of electronics, particularly in enhancing the functionality and comfort of wearable devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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