Beijing, China

Yu Teng

USPTO Granted Patents = 2 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019-2023

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2 patents (USPTO):

Title: Innovations by Yu Teng in Ultrasonic Cleaning Technologies

Introduction

Yu Teng is a notable inventor based in Beijing, China, recognized for his contributions to ultrasonic and megasonic cleaning technologies. With a total of two patents to his name, he has developed innovative devices that enhance cleaning processes in various applications.

Latest Patents

One of Yu Teng's latest patents is an ultrasonic/megasonic cleaning device. This device features a cleaning unit with an upper and lower casing that forms a hollow chamber. It includes an ultrasonic/megasonic generator and a bottom quartz component with a quartz rod array. The device is designed to dynamically vary the oscillation frequency of the ultrasonic/megasonic wave, improving cleaning efficiency.

Another significant patent is a cleaning device for atomizing and spraying liquid in a two-phase flow. This device comprises a nozzle with multiple liquid bypass pipelines and an exhaust mesh plate. The design allows for the creation of ultra-micro atomized particles that can effectively clean surfaces, such as wafers, through a reciprocating cleaning action.

Career Highlights

Yu Teng has worked with prominent companies in the microelectronics sector, including Beijing Naura Microelectronics Equipment Co., Ltd. and Beijing Sevenstar Electronics Co., Ltd. His experience in these organizations has contributed to his expertise in developing advanced cleaning technologies.

Collaborations

Yu Teng has collaborated with notable coworkers, including Wei Li and Yi Ke Wu. Their combined efforts have likely fostered innovation and advancements in their respective fields.

Conclusion

Yu Teng's innovative patents in ultrasonic and megasonic cleaning devices demonstrate his significant contributions to the field of cleaning technologies. His work continues to influence advancements in efficient cleaning solutions.

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