Yu-Sheng Liang

Title: Yu-Sheng Liang: Innovator in Vapor Deposition Technology

Introduction

Yu-Sheng Liang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of vapor deposition technology. His innovative designs have the potential to enhance the efficiency and effectiveness of vapor deposition apparatus.

Latest Patents

Yu-Sheng Liang holds a patent for a "Reaction chamber for vapor deposition apparatus." This invention features a susceptor to carry substrates, a ceiling, an upper cavity, and protrusions. The ceiling includes a front surface that faces the substrates, with an arrangement of front convex and concave parts that create a convex-concave surface. The rear surface of the ceiling corresponds to the front surface and also features convex and concave parts. The upper cavity is separated from the rear convex parts to define a first flow channel, while the protrusions in the rear concave parts create a second flow channel connected to the first, allowing for the introduction of a cooling fluid.

Career Highlights

Yu-Sheng Liang is currently employed at Hermes-Epitek Corporation, where he continues to develop innovative technologies. His work focuses on improving vapor deposition processes, which are crucial in various manufacturing applications.

Collaborations

Yu-Sheng Liang collaborates with talented colleagues, including Chien-Chin Chiu and Tsan-Hua Huang. Their combined expertise contributes to the advancement of their projects and the overall success of their innovations.

Conclusion

Yu-Sheng Liang's contributions to vapor deposition technology exemplify the impact of innovative thinking in engineering. His patent and ongoing work at Hermes-Epitek Corporation highlight his commitment to advancing this important field.