This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Innovations by Yu-Ru Li in Substrate Processing
Introduction
Yu-Ru Li is a notable inventor based in Yunlin, Taiwan. He has made significant contributions to the field of substrate processing, particularly in the area of protective gas flow during wafer dechucking in PVD chambers. His innovative work has implications for improving the efficiency and effectiveness of substrate processing technologies.
Latest Patents
Yu-Ru Li holds a patent titled "Protective gas flow during wafer dechucking in PVD chamber." This patent describes methods, systems, and apparatus for flowing a gas into a substrate processing chamber housing a substrate clamped to a chuck. The gas is introduced at a location above the substrate, and while the gas is introduced, the substrate is dechucked. This innovation enhances the processing environment and contributes to better outcomes in substrate handling.
Career Highlights
Yu-Ru Li is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to focus on advancing technologies that support the manufacturing of high-performance electronic devices.
Collaborations
Yu-Ru Li collaborates with Fuhong Zhang, a talented woman in the field. Their partnership exemplifies the importance of teamwork in driving innovation and achieving breakthroughs in technology.
Conclusion
Yu-Ru Li's contributions to substrate processing through his patent and work at Applied Materials, Inc. highlight his role as an influential inventor in the industry. His innovative approaches continue to shape the future of semiconductor manufacturing.