Seoul, South Korea

Yu Ri Lee

USPTO Granted Patents = 3 

 

Average Co-Inventor Count = 10.0

ph-index = 2

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 2015-2023

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3 patents (USPTO):Explore Patents

Title: Innovations of Yu Ri Lee

Introduction

Yu Ri Lee is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of technology, particularly in the development of advanced materials and mobile technology. With a total of 3 patents, his work reflects a commitment to innovation and improvement in various applications.

Latest Patents

One of Yu Ri Lee's latest patents is a catalyst composition with improved chemical warfare agent degradation ability and processability. This invention provides a catalyst composition that includes a copolymer of a first polymer and a second polymer, along with a metal-organic framework (MOF). The resulting film composite demonstrates enhanced processability and catalytic activity, making it a valuable advancement in the field. Another notable patent is related to a mobile terminal, which features a body with a flexible portion, a display unit, and a sensing unit that generates an electric signal in response to bending. This innovative design allows the controller to recognize the electric signal and control the display unit accordingly.

Career Highlights

Yu Ri Lee has worked with notable companies such as LG Electronics Inc. and the Korea Institute of Science and Technology. His experience in these organizations has contributed to his expertise and the development of his patented technologies.

Collaborations

Some of Yu Ri Lee's coworkers include Yong Jin Hwang and Chang Bai Won. Their collaboration has likely fostered an environment of innovation and creativity, leading to the successful development of new technologies.

Conclusion

In summary, Yu Ri Lee is an accomplished inventor whose work in catalyst compositions and mobile technology showcases his innovative spirit. His contributions to the field are significant and continue to influence advancements in technology.

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