Taipei City, Taiwan

Yu-Ping Tseng

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yu-Ping Tseng. Retrieved from https://idiyas.com/inventor/yu-ping-tseng-d9ubx7zh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Yu-Ping Tseng: Innovator in Semiconductor Polishing Technology

Introduction

Yu-Ping Tseng is a notable inventor based in Taipei City, Taiwan. She has made significant contributions to the field of semiconductor device manufacturing. Her innovative work focuses on enhancing the efficiency and effectiveness of chemical mechanical polishing processes.

Latest Patents

Yu-Ping Tseng holds a patent for a chemical mechanical polishing apparatus. This invention provides a method and apparatus for polishing a semiconductor substrate. The apparatus includes a carrier to hold the substrate, a polishing pad for polishing the substrate's surface, and a chemical mechanical polishing (CMP) slurry delivery arm. Additionally, it features a pad conditioner designed to maintain the polishing pad's effectiveness. This invention is crucial for improving the quality of semiconductor devices.

Career Highlights

Yu-Ping Tseng is currently employed at Taiwan Semiconductor Manufacturing Co., Ltd. Her work at this leading semiconductor company has allowed her to apply her innovative ideas in a practical setting. She has demonstrated a strong commitment to advancing semiconductor technology through her inventions.

Collaborations

Yu-Ping Tseng collaborates with her coworker, Ren-Hao Jheng, who is also a talented professional in the field. Their partnership exemplifies the collaborative spirit that drives innovation in the semiconductor industry.

Conclusion

Yu-Ping Tseng's contributions to semiconductor polishing technology highlight her role as an influential inventor. Her patent for a chemical mechanical polishing apparatus showcases her innovative approach to solving industry challenges. Through her work, she continues to impact the semiconductor manufacturing landscape positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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