San Jose, CA, United States of America

Yu Pan

USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: The Innovative Journey of Yu Pan: Advancements in 3D NAND Technology

Introduction

Yu Pan, an accomplished inventor based in San Jose, CA, is making significant contributions in the field of semiconductor technology. His remarkable work primarily focuses on the improvement of atomic layer deposition processes specifically for 3D NAND structures. With one patent to his name, Yu Pan is setting the stage for future innovations in this critical area of electronics.

Latest Patents

Yu Pan holds a patent for "Atomic layer deposition on 3D NAND structures," which presents methods and apparatuses designed for tungsten deposition with low roughness. The patent describes several innovative methods that include co-flowing nitrogen with hydrogen during the atomic layer deposition process. This approach effectively utilizes hydrogen as a reducing agent, thereby enhancing the quality of tungsten deposition. Additionally, the patent addresses depositing a cap layer, such as tungsten oxide or an amorphous tungsten layer, on the sidewall surfaces of 3D NAND structures. These disclosed methods have wide-ranging applications, particularly in improving the performance and reliability of 3D NAND devices.

Career Highlights

Yu Pan's career has been marked by his dedication to advancing semiconductor manufacturing processes. He currently works at Lam Research Corporation, where he continually explores new frontiers in technology. His extensive knowledge and innovative mindset reflect Lam Research's commitment to excellence in semiconductor equipment and services.

Collaborations

Throughout his career, Yu Pan has had the privilege of collaborating with skilled professionals, including his colleague Ruopeng Deng. Their combined expertise and teamwork have contributed to successful research and development outcomes in the field of atomic layer deposition.

Conclusion

As an inventor, Yu Pan is at the forefront of pioneering advancements in 3D NAND technology. His patented methods for tungsten deposition not only demonstrate his innovative spirit but also promise to push the envelope further in semiconductor manufacturing. Through his work at Lam Research Corporation and collaborations with fellow experts, Yu Pan is poised to continue making significant contributions that will shape the future of technology.

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