Seoul, South Korea

Yu Ning Sun

This inventor holds 1 USPTO granted patent. Top assignee: Korea University Research and Business Foundation. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yu Ning Sun. Retrieved from https://idiyas.com/inventor/yu-ning-sun

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Innovations of Yu Ning Sun in Electron Emitting Devices

Introduction

Yu Ning Sun is an accomplished inventor based in Seoul, South Korea. He has made significant contributions to the field of electron emitting devices, showcasing his expertise through innovative patents.

Latest Patents

Yu Ning Sun holds a patent for an "Electron emitting device using graphite adhesive material and manufacturing method for the same." This patent outlines a manufacturing method that utilizes a graphite adhesive material to create an efficient electron emitting device. The process involves mixing and dispersing a nanomaterial for electron emission with a graphite filler in a solvent, drying the mixture, and preparing a paste by combining a graphite binder with the dried components.

Career Highlights

Yu Ning Sun is affiliated with the Korea University Research and Business Foundation, where he applies his knowledge and skills to advance research in electron emitting technologies. His work has garnered attention for its potential applications in various electronic devices.

Collaborations

Yu Ning Sun collaborates with notable colleagues, including Cheol Jin Lee and Dong Hoon Shin, who contribute to his research endeavors and innovations in the field.

Conclusion

Yu Ning Sun's contributions to the development of electron emitting devices highlight his innovative spirit and dedication to advancing technology. His patent reflects a significant step forward in the manufacturing methods of such devices, showcasing the potential for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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