This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Texas Instruments Corporation. Active years: 2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004
Title: The Innovations of Yu-Lun Lin: A Pioneer in Etch Process Control
Introduction
Yu-Lun Lin, an accomplished inventor located in Plano, TX, has made significant contributions to the field of etching processes in semiconductor manufacturing. With a keen focus on critical dimensions, Lin's work has the potential to enhance the efficiency and accuracy of various processes utilized within the industry.
Latest Patents
Lin holds a patent for a pioneering method for controlling critical dimensions (CD) in an etch process. The patent, titled "Method for controlling a critical dimension (CD) in an etch process," outlines a systematic approach for determining resist trim times. The invention involves obtaining resist profile data and critical dimension data of a patterned resist layer using a scatterometer. The estimated trim time for the patterned resist layer is derived from this data, showcasing Lin's innovative approach to improving etch process reliability and accuracy.
Career Highlights
Yu-Lun Lin is a key team member at Texas Instruments Corporation, a renowned company in the field of semiconductor design and manufacturing. Throughout her career, Lin has demonstrated exceptional skills in innovation and problem-solving. Her patent is a testament to her commitment to advancing technology while servicing the needs of the semiconductor industry.
Collaborations
Lin collaborates closely with noted colleagues, including Nital S Patel and Brian Ashley Smith, whose expertise complements her innovative pursuits. Together, they contribute to the advancements in semiconductor technologies, fostering a collaborative environment that encourages creativity and technical excellence.
Conclusion
Yu-Lun Lin's contributions to the field of etching processes reflect a commitment to innovation and quality. Her patented method not only emphasizes the importance of critical dimension control but also illustrates the potential impact of effective collaboration within the industry. Lin serves as an exemplary figure for aspiring inventors and current professionals, showcasing how innovative thinking can lead to significant technological advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile