Yu Lun Ke

Title: Yu Lun Ke and Semiconductor Interconnect Innovation.

Introduction

Yu Lun Ke is an inventor based in Hsinchu City, Taiwan. His work includes semiconductor fabrication, particularly methods for controlling etch profiles in interconnect structures.

Latest Patents

Ke is associated with 1 patent, titled “Etch Profile Control of Interconnect Structures.” The disclosed method forms an etch stop layer on a substrate, followed by a metal oxide layer and an interlayer dielectric layer. It then creates a trench etch opening, forms a capping layer over that opening, and creates a via etch opening above the capping layer.

Career Highlights

Ke is associated with Taiwan Semiconductor Manufacturing Co., Ltd. His patent describes a process for shaping openings in semiconductor interconnect structures.

Collaborations

Yu-Wei Kuo and Yi-Wei Chiu are identified as Ke’s coworkers. Their names are provided as professional associations, though specific joint work on this patent is not detailed.

Conclusion

Yu Lun Ke’s patent focuses on etch-profile control for semiconductor interconnect fabrication, reflecting his association with Taiwan Semiconductor Manufacturing Co., Ltd.