Yu-Ling Hsieh

Title: Yu-Ling Hsieh: Innovator in Semiconductor Technology

Introduction

Yu-Ling Hsieh is a prominent inventor based in Xindian, Taiwan. She has made significant contributions to the field of semiconductor technology, particularly in the area of solder masks. Her innovative work has led to the development of a patent that enhances the manufacturing process of semiconductor chips.

Latest Patents

Yu-Ling Hsieh holds a patent for a "Solder mask with anchor structures." This invention involves various substrates or circuit boards designed to receive a semiconductor chip. The patent describes a method of manufacturing that includes forming a first opening in a solder mask positioned on a side of a substrate. Notably, the first opening does not extend to the side, while a second opening is formed that does. The first opening serves as an underfill anchor site, which is crucial for the stability and reliability of semiconductor devices.

Career Highlights

Throughout her career, Yu-Ling Hsieh has worked with notable companies in the technology sector. She has been associated with ATI Technologies and Advanced Micro Devices Corporation, where she has contributed her expertise in semiconductor manufacturing and design.

Collaborations

Yu-Ling has collaborated with several professionals in her field, including Andrew K. W. Leung and Roden R. Topacio. These collaborations have further enriched her work and have led to advancements in semiconductor technology.

Conclusion

Yu-Ling Hsieh is a trailblazer in the semiconductor industry, with her innovative patent and extensive career in technology. Her contributions continue to influence the development of semiconductor manufacturing processes.