Yu Liang Huang

Title: Innovations of Yu Liang Huang in Vacuum Technology

Introduction

Yu Liang Huang is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of vacuum technology, particularly through his innovative designs that enhance the functionality of vacuum chucks.

Latest Patents

Yu Liang Huang holds a patent for a vacuum chuck that features a unique moisture gate structure. This design allows moisture to escape, thereby reducing warpage in workpieces when they are placed on the vacuum chuck. The moisture gate structure includes a base portion that extends laterally from the central vacuum area, along with multiple protrusions that ensure proper contact with the backside of the workpiece, such as a wafer on a carrier. Additionally, the vacuum chuck may incorporate guide portions to maintain the alignment of the workpiece during operation.

Career Highlights

Yu Liang Huang is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., where he continues to innovate and develop advanced technologies in semiconductor manufacturing. His work has been instrumental in improving the efficiency and effectiveness of vacuum systems used in the industry.

Collaborations

Yu Liang Huang collaborates with talented colleagues, including Po-Yu Su and Young-Wei Lin, who contribute to the innovative environment at Taiwan Semiconductor Manufacturing Company Ltd. Their teamwork fosters a culture of creativity and advancement in technology.

Conclusion

Yu Liang Huang's contributions to vacuum technology exemplify the importance of innovation in the semiconductor industry. His patented designs not only enhance performance but also pave the way for future advancements in manufacturing processes.