Belmont, Canada

Yu Lei

This inventor holds 3 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yu Lei. Retrieved from https://idiyas.com/inventor/yu-lei-xj6oybch

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2026

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3 patents (USPTO):Explore Patents

Title: Yu Lei: Innovator in Semiconductor Processing

Introduction

Yu Lei is a notable inventor based in Belmont, California. He has made significant contributions to the field of semiconductor substrate processing. His innovative work has led to the development of a patented technology that enhances the efficiency of semiconductor manufacturing.

Latest Patents

Yu Lei holds a patent for the "Lower edge ring of a process kit for semiconductor substrate processing." This invention is crucial for improving the performance and reliability of semiconductor processing equipment. His patent portfolio includes 1 patent that showcases his expertise in this specialized area.

Career Highlights

Yu Lei is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His role involves working on advanced technologies that drive innovation in semiconductor manufacturing. His contributions have been instrumental in enhancing the capabilities of the company's product offerings.

Collaborations

Throughout his career, Yu Lei has collaborated with talented professionals in the field. Notable coworkers include Avgerinos V Gelatos and Yung-Hsin Lee. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

In summary, Yu Lei is a distinguished inventor whose work in semiconductor processing has made a significant impact on the industry. His patent and collaborations reflect his commitment to innovation and excellence in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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