Chichibu, Japan

Yu Kitsuno

This inventor holds 1 USPTO granted patent. Top assignee: Showa Denko K.k.. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yu Kitsuno. Retrieved from https://idiyas.com/inventor/yu-kitsuno

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 62(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Yu Kitsuno: Innovator in Silane Production

Introduction

Yu Kitsuno is a notable inventor based in Chichibu, Japan. He has made significant contributions to the field of chemical engineering, particularly in the production of silanes. His innovative methods have the potential to enhance various industrial applications.

Latest Patents

Yu Kitsuno holds a patent for a method for producing a higher silane. This method involves producing tri- or higher-silane from mono- or lower-silane. It is characterized by reacting a lower silane in the first reaction zone and subsequently reacting a portion or all of the reaction product in a second or subsequent reaction zone. This patent showcases his expertise and innovative approach in the field.

Career Highlights

Yu Kitsuno is currently employed at Showa Denko K.K., a leading company in the chemical industry. His work there has allowed him to apply his innovative ideas and contribute to advancements in silane production. His career reflects a commitment to research and development in chemical processes.

Collaborations

Yu has collaborated with notable colleagues such as Syoichi Tazawa and Kotaro Yano. These collaborations have likely enriched his research and contributed to the success of his projects.

Conclusion

Yu Kitsuno is a distinguished inventor whose work in silane production exemplifies innovation in chemical engineering. His contributions are valuable to the industry and highlight the importance of research and development in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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