New Jersey, CA, United States of America

Yu Jin

This inventor holds 1 USPTO granted patent. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yu Jin. Retrieved from https://idiyas.com/inventor/yu-jin-en82ejuu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Yu Jin in Image Sensor Fabrication

Introduction

Yu Jin is a notable inventor based in New Jersey, CA (US). He has made significant contributions to the field of semiconductor devices, particularly in the area of image sensor fabrication. His innovative approaches have led to advancements that enhance the accuracy and efficiency of manufacturing processes.

Latest Patents

Yu Jin holds a patent for an "Alignment method for image sensor fabrication and associated semiconductor device." This patent outlines a method that involves forming sets of alignment marks using key process mask layers. The goal is to improve alignment registration between these layers, thereby reducing the number of alignment transfers and enhancing alignment accuracy between pixel elements. This method is crucial for the development of high-quality image sensors.

Career Highlights

Throughout his career, Yu Jin has focused on improving semiconductor technologies. His work has been instrumental in advancing the capabilities of image sensors, which are vital components in various electronic devices. His innovative methods have garnered attention in the industry, showcasing his expertise and commitment to technological advancement.

Collaborations

Yu Jin has collaborated with fellow inventor Qin Wang on various projects. Their partnership has led to the development of cutting-edge technologies in the semiconductor field, further enhancing the impact of their work.

Conclusion

Yu Jin's contributions to image sensor fabrication demonstrate his innovative spirit and dedication to improving semiconductor technologies. His patent reflects a significant advancement in the field, showcasing the importance of precision in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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