Yu-Hua Chang

Title: Yu-Hua Chang: Innovator in Optoelectronic Devices

Introduction

Yu-Hua Chang is a prominent inventor based in Newark, CA (US). He has made significant contributions to the field of optoelectronic devices, particularly in the area of film-based image sensors. His innovative approach has led to the development of a unique method for fabricating these devices.

Latest Patents

Yu-Hua Chang holds 1 patent for his invention titled "Isolation structures in film-based image sensors." This patent describes a method for fabricating an optoelectronic device that includes forming an isolation structure between an array of pixel electrodes and a built-in pad (BIP) on a dielectric layer of an integrated circuit. The process involves depositing a photosensitive film over the dielectric layer, ensuring that at least one pinch point is formed in the photosensitive film at the edge of the isolation structure. The method further includes depositing an electrode layer, which is at least partially transparent, over the photosensitive film, etching away the photosensitive film from the BIP, and finally depositing a metal layer over the BIP in contact with the electrode layer.

Career Highlights

Yu-Hua Chang is currently employed at Apple Inc., where he continues to push the boundaries of technology in the field of optoelectronics. His work has been instrumental in advancing the capabilities of image sensors, which are crucial for various applications in modern electronics.

Collaborations

Throughout his career, Yu-Hua has collaborated with notable colleagues, including Zachary Michael Beiley and Richard W. Snow. These collaborations have fostered an environment of innovation and creativity, leading to advancements in their respective fields.

Conclusion

Yu-Hua Chang's contributions to the field of optoelectronic devices exemplify the spirit of innovation. His patent on isolation structures in film-based image sensors showcases his expertise and commitment to advancing technology.