This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Nanoshields Technology Limited. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: Innovations by Yu Hang Leung in Protective Mask Technology
Introduction
Yu Hang Leung is an innovative inventor based in Hong Kong, CN. He has made significant contributions to the field of protective equipment, particularly through his work on polymer-based materials. His dedication to enhancing safety through technology is evident in his patented inventions.
Latest Patents
Yu Hang Leung holds a patent for protective masks made with polymer-based materials. The patent details methods for forming interlaced polymer-based materials, which include applying adhesive to a substrate, electrospinning a first polymer solution onto the substrate from a first group of spinning electrodes, and electrospinning a second polymer solution onto the substrate from a second group of spinning electrodes. The process concludes with applying hot air to dry the electrospun materials, resulting in effective protective masks. He has 1 patent to his name.
Career Highlights
Yu Hang Leung is associated with Nanoshields Technology Limited, where he continues to develop innovative solutions for protective gear. His work focuses on improving the safety and comfort of protective masks, which are essential in various environments.
Collaborations
Yu collaborates with talented individuals in his field, including coworkers Siu Wah Wong and Ho Wang Tong. Their combined expertise contributes to the advancement of protective technologies.
Conclusion
Yu Hang Leung's contributions to the field of protective masks highlight his commitment to innovation and safety. His work with polymer-based materials represents a significant advancement in protective equipment technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile