Peitou, Taiwan

Yu-Chien Hsiao


Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2002-2004

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2 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Yu-Chien Hsiao in Semiconductor Technology

Introduction: Yu-Chien Hsiao, an accomplished inventor based in Peitou, Taiwan, has made significant contributions to the field of semiconductor technology with two innovative patents. His work focuses on optimizing processes critical to the manufacturing and quality assurance of semiconductor wafers.

Latest Patents: Among his notable patents, Hsiao developed a method for metrology in monitoring a rapid thermal annealing process. This method involves implanting ions into a semiconductor wafer and utilizing thermal wave measurements to ensure the wafer heats to precise specifications. His second patent is directed towards an innovative method and apparatus for drying wafers after a wet bench process, using a mixture of alcohol vapor and inert gas to effectively remove DI water without leaving organic residues behind.

Career Highlights: Yu-Chien Hsiao works at the Taiwan Semiconductor Manufacturing Company, one of the world's leading semiconductor fabrication companies. His expertise and patents play a crucial role in improving the efficiency and quality of semiconductor manufacturing processes.

Collaborations: Throughout his career, Hsiao has collaborated with esteemed colleagues including Jih-Churng Twu and Ming-Dar Guo, further enhancing the innovation landscape within the semiconductor industry.

Conclusion: Yu-Chien Hsiao's contributions to semiconductor technology through his patents are noteworthy. His innovative methods for monitoring thermal processes and drying wafers significantly impact the efficiency and performance of semiconductor manufacturing. As technology continues to evolve, his contributions remain vital to advancements in this critical industry.

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