Shiga-ken, Japan

Yozo Nakamura


Average Co-Inventor Count = 5.4

ph-index = 2

Forward Citations = 10(Granted Patents)


Location History:

  • Kurita-gun, JP (1999)
  • Kyoto, JP (2000)
  • Shiga-ken, JP (2007 - 2008)

Company Filing History:


Years Active: 1999-2008

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4 patents (USPTO):Explore Patents

Title: Yozo Nakamura: Innovator in High Wear Resistant Hard Films

Introduction

Yozo Nakamura is a distinguished inventor based in Shiga-ken, Japan. He has made significant contributions to the field of materials science, particularly in the development of high wear resistant hard films. With a total of 4 patents to his name, Nakamura's work has garnered attention for its innovative approach to enhancing material durability.

Latest Patents

Nakamura's latest patents focus on a high wear resistant hard film characterized by a unique structure. This film includes a coating layer made of metal nitride, which is applied to the outer surface of an object to be treated. Beneath this coating layer lies a substrate layer composed of titanium or chromium nitride. An intermediate layer, which contains compositions of the coating layer, is strategically placed at the interface between the coating and substrate layers. This innovative design allows for a hard film that exhibits excellent oxidation resistance at temperatures of 1000°C or higher, alongside remarkable wear resistance.

Career Highlights

Throughout his career, Yozo Nakamura has been associated with Mitsubishi Heavy Industries Limited, where he has played a pivotal role in advancing material technologies. His expertise in developing high-performance coatings has positioned him as a key figure in the industry.

Collaborations

Nakamura has collaborated with notable colleagues, including Tsuneo Egawa and Masanobu Misaki. These partnerships have further enriched his research and development efforts, leading to groundbreaking advancements in hard film technologies.

Conclusion

In summary, Yozo Nakamura is a prominent inventor whose work in high wear resistant hard films has made a significant impact in materials science. His innovative patents and collaborations continue to push the boundaries of technology, ensuring enhanced durability for various applications.

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