Saijo, Japan

Yousuke Narada

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Fujibo Holdings, Inc.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yousuke Narada. Retrieved from https://idiyas.com/inventor/yousuke-narada

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Yousuke Narada: Innovator in Polishing Technology

Introduction

Yousuke Narada is a notable inventor based in Saijo, Japan. He has made significant contributions to the field of polishing technology, particularly through his innovative designs and methods. His work has garnered attention for its practical applications in various industries.

Latest Patents

Yousuke Narada holds a patent for a "Polishing pad and method for producing the same, and method for producing polished product." This invention features a polishing pad made from a knitted fabric, either through warp knitting or weft knitting, which is impregnated with resin. The unique design includes a cross section cut in the surface direction of the knitted fabric, providing an effective polishing surface.

Career Highlights

Narada is currently employed at Fujibo Holdings, Inc., where he continues to develop innovative solutions in polishing technology. His expertise and dedication to his work have positioned him as a valuable asset to the company.

Collaborations

Yousuke Narada has collaborated with talented coworkers such as Shin Tokushige and Keisuke Nakase. Their combined efforts contribute to the advancement of technology within their field.

Conclusion

Yousuke Narada's contributions to polishing technology through his innovative patent demonstrate his commitment to advancing industry standards. His work continues to influence the field and showcases the importance of innovation in practical applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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