Asan, South Korea

Youngsu Chae

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Youngsu Chae. Retrieved from https://idiyas.com/inventor/youngsu-chae-q2m7cazz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Youngsu Chae: Innovator in Laser Technology

Introduction

Youngsu Chae is a prominent inventor based in Asan, South Korea. He is known for his contributions to laser technology, particularly in the field of laser annealing. His innovative approach has led to advancements that enhance the efficiency and effectiveness of laser processing methods.

Latest Patents

Youngsu Chae holds a patent for a "Laser annealing apparatus and laser annealing method using the same." This invention includes a sophisticated laser annealing apparatus that features multiple lasers and a laser controller. The controller manages the lasers to emit beams at different timings, which are then mixed to create a processing beam. This processing beam consists of three distinct laser beams with varying pulse peaks, optimizing the annealing process.

Career Highlights

Youngsu Chae is currently employed at Samsung Display Co., Ltd., where he continues to develop and refine his innovative technologies. His work at Samsung Display has positioned him as a key player in the advancement of display technologies.

Collaborations

Throughout his career, Youngsu has collaborated with notable colleagues, including Jin Hong Jeun and Akifumi Sangu. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Youngsu Chae's contributions to laser technology exemplify the spirit of innovation in the field. His patent and work at Samsung Display Co., Ltd. highlight his commitment to advancing technology and improving processes in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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