Youngrae Park

Title: Youngrae Park: Innovator in Fluopolymer Technology

Introduction

Youngrae Park is a notable inventor based in Wilmington, DE (US). He has made significant contributions to the field of materials science, particularly in the development of advanced polishing pads for semiconductor and optical applications. With a total of 3 patents to his name, Park's innovations are paving the way for improved manufacturing processes in the electronics industry.

Latest Patents

One of Youngrae Park's latest patents is the "Low-debris fluopolymer composite CMP polishing pad." This invention provides a polymer-polymer composite polishing pad that is useful for polishing or planarizing substrates, including semiconductor, optical, and magnetic materials. The polishing pad features a polishing layer with a surface designed for effective substrate treatment. It includes a polymeric matrix that contains gas-filled or liquid-filled polymeric microelements, along with fluoropolymer particles embedded within the matrix. These fluoropolymer particles possess a tensile strength lower than that of the polymeric matrix, allowing diamond abrasive materials to cut the fluoropolymer and reduce the generation of pad debris particles in the 1 µm to 10 µm size range.

Another significant patent by Park is the "Fluopolymer composite CMP polishing method." This method outlines a process for polishing or planarizing a substrate using a polymer-polymer composite polishing pad. The method begins with attaching the polishing pad to a polishing device, followed by the application of a cationic particle-containing slurry. The conditioning of the polishing pad exposes the fluoropolymer particles, which enhances the electronegativity at the polishing surface. This innovation stabilizes the cationic particle-containing slurry, thereby decreasing the precipitation rate and improving the overall polishing efficiency.

Career Highlights

Youngrae Park is currently associated with Rohm and Haas Electronic Materials CMP Holdings, Inc., where he continues to innovate in the field of electronic materials. His work has been instrumental in advancing the technology used in semiconductor manufacturing, contributing to more efficient and effective production methods.

Collaborations

Throughout his career, Park has collaborated with esteemed colleagues, including Mohammad T Islam and Nan-Rong Chiou. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

In summary, Youngrae Park is a distinguished inventor whose work in fluopolymer technology has significantly impacted the electronics industry