Bucheon, South Korea

Youngouk Kim

This inventor holds 1 USPTO granted patent. Top assignee: Korea Electronics Technology Institute. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Youngouk Kim. Retrieved from https://idiyas.com/inventor/youngouk-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Youngouk Kim - Innovator in Deformation Measurement Technology

Introduction

Youngouk Kim is a notable inventor based in Bucheon, South Korea. He has made significant contributions to the field of deformation measurement technology. His innovative work focuses on creating devices that can accurately measure pressure and shearing forces.

Latest Patents

Youngouk Kim holds a patent for a "Deformation measurement sensor for measuring pressure and shearing force and structure therefor." This invention includes a plurality of beams shaped like a lattice, with a strain gauge attached to each beam for measuring deformation rates. The design features a frame that surrounds the beams and includes holes for arranging lines at the intersections of the beams. This configuration allows for precise measurement of deformation rates based on the pressures or shearing forces exerted on various areas. He has 1 patent to his name.

Career Highlights

Youngouk Kim is affiliated with the Korea Electronics Technology Institute, where he continues to develop and refine his inventions. His work has been instrumental in advancing the capabilities of deformation measurement technologies.

Collaborations

He collaborates with Junghoon Hwang, contributing to the innovative projects at their institute.

Conclusion

Youngouk Kim's contributions to deformation measurement technology highlight his role as a key innovator in this field. His patent reflects his commitment to precision and advancement in measurement techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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