Asan-si, South Korea

Youngjun Choi


Average Co-Inventor Count = 5.8

ph-index = 2

Forward Citations = 4(Granted Patents)


Location History:

  • Yongin-si, KR (2016 - 2018)
  • Asan-si, KR (2018 - 2020)
  • Chungcheongnam-do, KR (2020)

Company Filing History:


Years Active: 2016-2020

Loading Chart...
5 patents (USPTO):Explore Patents

Title: Youngjun Choi: Innovator in Substrate Processing Technology

Introduction

Youngjun Choi is a prominent inventor based in Asan-si, South Korea. He has made significant contributions to the field of substrate processing, holding a total of 5 patents. His innovative work focuses on improving the efficiency and safety of substrate treatment processes.

Latest Patents

Among his latest patents is a standby port and substrate processing apparatus. This invention is designed to exhaust fumes generated when a processing liquid is discharged into the standby port before it is supplied onto a substrate. This mechanism effectively prevents pollution of the chamber atmosphere. Another notable patent involves a liquid supply unit and substrate treating apparatus. This apparatus includes a nozzle that discharges a treatment liquid, which is a mixture of two different liquids. The design features a mixing space and a buffer space that helps decrease the flow velocity of the treatment liquid, enhancing the overall treatment process.

Career Highlights

Youngjun Choi has worked with leading companies in the technology sector, including Samsung Display Co., Ltd. and Semes Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas in substrate processing technology.

Collaborations

Throughout his career, Youngjun has collaborated with talented individuals such as Byungsun Bang and Jin Tack Yu. These collaborations have contributed to the advancement of his projects and the successful development of his patents.

Conclusion

Youngjun Choi's contributions to substrate processing technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges in the field and a dedication to finding effective solutions.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…