Youngdeok Kwon

Title: Youngdeok Kwon: Innovator in Photomask Fabrication

Introduction

Youngdeok Kwon is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the area of photomask fabrication. With a total of 2 patents, Kwon's work is instrumental in advancing the manufacturing processes of semiconductor devices.

Latest Patents

Kwon's latest patents include a method of fabricating a photomask and a method of manufacturing semiconductor devices. The first patent outlines a fabrication method that involves designing a layout of patterns on a wafer, which is crucial for chip formation. This method includes correcting the layout to create a photoresist pattern that serves as an etching mask. Additionally, it incorporates optical proximity correction (OPC) at both the chip and shot levels to enhance the accuracy of the patterns. The second patent focuses on designing a circuit mask pattern and a monitoring mask pattern that detects critical dimensions in both the mask and wafer. This method also employs optical proximity correction to ensure precision in the photomask creation process.

Career Highlights

Youngdeok Kwon is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and semiconductor industry. His expertise in photomask technology has positioned him as a key player in the development of advanced semiconductor manufacturing techniques.

Collaborations

Kwon has collaborated with notable colleagues, including Myungsoo Noh and Jeonglim Kim, who share his commitment to innovation in semiconductor technology.

Conclusion

Youngdeok Kwon's contributions to photomask fabrication and semiconductor device manufacturing highlight his role as an influential inventor in the technology sector. His patents reflect a deep understanding of the complexities involved in semiconductor production, paving the way for future advancements in the field.