Gumi, South Korea

Young-Tae Park

This inventor holds 2 USPTO granted patents. Top assignee: Kolon Industries, Inc.. Active years: 2006-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Young-Tae Park. Retrieved from https://idiyas.com/inventor/young-tae-park-7onx5cla

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2006-2010

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2 patents (USPTO):Explore Patents

Title: Young-Tae Park: Innovator in Polyamide Yarn Technology.

Introduction

Young-Tae Park is a notable inventor based in Gumi, South Korea. He has made significant contributions to the field of materials science, particularly in the development of polyamide yarns. With a total of 2 patents, his work focuses on enhancing the properties of yarns used in various applications.

Latest Patents

One of Young-Tae Park's latest patents is for a full dull polyamide 6 yarn and a process for preparing the same. This invention involves a yarn that contains 1.5 to 2.5% by weight of titanium dioxide relative to the weight of the yarn. The yarn also includes 35 to 95 titanium dioxide particles with a major axial length greater than 5 µm contained in 50 mg of the yarn. Additionally, it incorporates 0.1 to 0.5% by weight of phosphate salt as a wetting agent relative to the weight of titanium dioxide. The process improves the full dull effect and drape property of the yarn without degrading its physical properties and operability.

Career Highlights

Young-Tae Park is currently employed at Kolon Industries, Inc., where he continues to innovate in the field of yarn technology. His work has been instrumental in advancing the quality and functionality of polyamide yarns.

Collaborations

He collaborates with Jae-Young Kim, who is also involved in similar research and development efforts.

Conclusion

Young-Tae Park's contributions to the field of polyamide yarn technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of materials science and a drive to improve product performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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