This inventor holds 1 USPTO granted patent. Top assignee: Integrated Device Technology, Inc.. Active years: 2005.
Company Filing History:
Years Active: 2005
Title: Young T Woo - Innovator in Semiconductor Technology
Introduction
Young T Woo is a prominent inventor based in Portland, OR (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of device variation minimization. His innovative approach has led to advancements that enhance the performance and reliability of PMOS transistors.
Latest Patents
Young T Woo holds a patent titled "Nitrogen implementation to minimize device variation." This patent describes a rapid thermal nitridation (RTN) process that produces a nitrogen concentration gradient in an oxynitride layer. This gradient compensates for transistor threshold voltage effects caused by thickness variations in the oxynitride layer. The process allows for greater dopant penetration through thicker gate dielectrics in PMOS transistors, ensuring consistent threshold voltage values across all transistors on a single wafer. The nitrogen concentration gradient is achieved by regulating the flow of nitrous oxide during RTN processing, which creates a concentration distribution that effectively balances the effects of thickness variations.
Career Highlights
Young T Woo is associated with Integrated Device Technology, Inc., where he continues to push the boundaries of semiconductor innovation. His work has been instrumental in developing technologies that improve the efficiency and performance of electronic devices. With a focus on practical applications, Woo's inventions have the potential to impact various sectors within the technology industry.
Collaborations
Young T Woo has collaborated with Jae-Gyung Ahn, contributing to the advancement of semiconductor technologies. Their partnership has fostered innovative solutions that address complex challenges in the field.
Conclusion
Young T Woo's contributions to semiconductor technology exemplify the spirit of innovation. His patent on nitrogen implementation showcases his commitment to enhancing device performance and reliability. As he continues to work at Integrated Device Technology, Inc., his future endeavors are anticipated to further influence the industry.