Company Filing History:
Years Active: 1998-1999
Title: The Innovative Journey of Young-soh Park, Inventor Extraordinaire
Introduction: Young-soh Park, a distinguished inventor based in Kyungki-do, South Korea, has made significant contributions to the field of semiconductor technology. With two granted patents to his name, his work at Samsung Electronics Co., Ltd. showcases his expertise and inventive spirit.
Latest Patents: Young-soh Park is known for his groundbreaking patents, including the "Methods of forming integrated circuit capacitors using metal reflow." This innovative method involves several steps: forming an electrically insulating layer on a semiconductor substrate, patterning this layer to create contact holes, and depositing a barrier metal layer. The process includes reflowing a lower electrode metal layer at temperatures exceeding 650°C in a nitrogen gas environment to define the lower capacitor electrode. His other notable patent, "Projection exposure method and mask employed therein," utilizes a transparent mask substrate positioned at a slanted angle to effectively expose an object, enhancing pattern formation capabilities.
Career Highlights: Young-soh Park's career is marked by his affiliation with Samsung Electronics Co., Ltd., where he has played a vital role in advancing semiconductor technologies. His insightful approach in the field has led to impactful innovations that streamline integrated circuit fabrication processes.
Collaborations: Throughout his career, Young-soh Park has worked closely with talented colleagues such as Sang-in Lee and Cheol-Seong Hwang. Their collaboration has fostered an environment of creativity and technical excellence at Samsung, driving significant advancements in the technology sector.
Conclusion: Young-soh Park stands as a testament to innovation in semiconductor technology. His contributions, evidenced by his patents and collaborative efforts, reflect a commitment to advancing the industry. With a passion for engineering and invention, Young-soh Park continues to inspire the next generation of inventors.